Joost Frenken has been appointed first ARCNL director. This is a joint press release by ASML, AMOLF, FOM, NWO, University of Amsterdam, and VU. Amsterdam, 7 November 2013 - The Advanced Research Center for Nanolithography …
We are pleased to announce 2016 International Workshop on EUV and Soft X-Ray Sources, which is this year hosted by ARCNL. This leading annual workshop focuses on the latest scientific and technical developments related to …