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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Nanoscale Imaging and Metrology

  • M.C. Velsink, Z. Lyu, P.W.H. Pinkse and L.V. Amitonova, Comparison of round- and square-core fibers for sensing, imaging, and spectroscopy, Opt. Express 29, (5), 6523-6531 (2021)

  • B. Lochocki, K. Abrashitova, J.F. de Boer and L.V. Amitonova, Ultimate resolution limits of speckle-based compressive imaging, Opt. Express 29, (3), 3943-3955 (2021)

  • M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse, Spatiotemporal focusing through a multimode fiber via time-domain wavefront shaping, Opt. Express 29, (1), 272-290 (2021)

  • L.V. Amitonova and J.F. de Boer, Endo-microscopy beyond the Abbe and Nyquist limits, Light : Sci. Appl. 9, (1), 81: 1-12 (2020)

  • L.V. Amitonova, T.B.H. Tentrup, I.M. Vellekoop and P.W.H. Pinkse, Quantum key establishment via a multimode fiber, Opt. Express 28, (5), 5965-5981 (2020)

  • L.V. Amitonova and J.F. de Boer, Sensitivity analysis of Raman endoscopy with and without wavefront shaping, Opt. Express 28, (3), 3779-3788 (2020)

  • M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse: Imaging Applications of Time-Domain Wavefront Shaping In: Frontiers in Optics / Laser Science, paper FW5F.3, OSA Technical Digest (Optical Society of America), 2020.

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter