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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
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Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - Light-Matter Interaction
T.J. van den Hooven, L. Cruciani and P.C.M. Planken,
Broadband optical detection of strain waves in a thin ruthenium film
, Opt. Express
33
, (16), 33232-33247 (2025)
T.J. van den Hooven,
Broadband Optical Detection of Ultrafast Strain Waves in Metals
, University of Amsterdam, 2025-06-16
E. Abram,
What is Light-Induced Damage? Pre-ablation regime optical and morphological changes in nanometer thick films and grating structures
, University of Amsterdam, 2025-06-04
L. Cruciani,
Ruthenium thin films: terahertz generation and direct laser patterning
, University of Amsterdam, 2025-05-01
S. van Vliet,
Surface chemistry of ruthenium
, University of Amsterdam, 2025-04-30
T.J. van den Hooven and P.C.M. Planken,
Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances
, Opt. Lett.
50
, (5), 1445-1448 (2025)
K. Chaudhary, M. Illienko, T.J. van den Hooven, S. Witte and P.C.M. Planken,
Optically enhancing and controlling photoacoustic signals using ultra-thin semiconductor coatings on metal surfaces
, Opt. Express
33
, (1), 199-214 (2025)
E. Abram, N. Orlov, E.C. Garnett and P.C.M. Planken,
Sub-ablation-threshold light-induced modification of thin ruthenium layers detected using optical reflectance
, J. Appl. Phys.
136
, (24), 245305: 1-14 (2024)
J. Antonowicz, A. Olczak, K. Sokolowski-Tinten, P. Zalden, I. Milov, R. Sobierajski and et. al,
Structural pathways for ultrafast melting of optically excited thin polycrystalline Palladium films
, Acta Mater.
276
, 120043: 1-15 (2024)
F. Akhmetov, J. Vorberger, I. Milov, I. Makhotkin and M. Ackermann,
Ab initio-simulated optical response of hot electrons in gold and ruthenium
, Opt. Express
32
, (11), 19117-19132 (2024)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter