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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Publications - High-Harmonic Generation & EUV Science
M.L.S. van der Geest, N. Sadegh, T.M. Meerwijk, E.I. Wooning, L. Wu, E. Bloem, S. Castellanos Ortega, A.M. Brouwer and P.M. Kraus,
Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source
, Rev. Sci. Instrum.
92
, (11), 113004: 1-9 (2021)
R. Géneaux, I. Timrov, C.J. Kaplan, A.D. Ross, P.M. Kraus and S.R. Leone,
Coherent energy exchange between carriers and phonons in Peierls-distorted bismuth unveiled by broadband XUV pulses
, Phys. Rev. Res.
3
, (3), 033210: 1-12 (2021)
F. Campi, S.D.C. Roscam Abbing, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus:
Efficient extreme-ultraviolet multi-band high-order wave mixing in silica
In:
Proc. SPIE 11886, International Conference on X-Ray Lasers 2020, SPIE-Intl Soc Optical Eng, 2021. - pp. 117-124
J.H. Buss, I. Grguras, S. Starosielec, M.V. Petev, T. Golz, M. Schulz, M.J. Prandolini, P.M. Kraus, F. Campi and R. Riedel:
High-power OPCPAs at 1450–2400 nm wavelength
In:
Nonlinear Frequency Generation and Conversion: Materials and Devices, 116700 (5 March 2021), SPIE-Intl Soc Optical Eng, 2021.
S.D.C. Roscam Abbing, Z.-Y. Zhang, R. Kolkowski, F. Campi, A.F. Koenderink and P.M. Kraus:
Coherent diffractive extreme-ultraviolet generation from nanostructured silica
In:
Conference on Lasers and Electro-Optics, CLEO 2021, OPG, 2021.
J.H. Buss, S. Starosielec, I. Grguras, T. Golz, M.J. Prandolini, M. Schulz, P.M. Kraus and R. Riedel:
Few-cycle OPCPA at 2 µm with up to 100 W average power
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.3, OSA Technical Digest (Optical Society of America), 2020.
N. Sadegh, M.L.S. van der Geest, J. Haitjema, F. Campi, S. Castellanos Ortega, P.M. Kraus and A.M. Brouwer,
XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy
, J. Photopolymer. Sci.Tec.
33
, (2), 145-151 (2020)
R. Géneaux, C.J. Kaplan, L. Yue, A.D. Ross, E. Bækhøj, P.M. Kraus, H.-T. Chang, A. Guggenmos, M.-Y. Huang, M. Zürch, K.J. Schafer, D.M. Neumark, M.B. Gaarde and S.R. Leone,
Attosecond Time-Domain Measurement of Core-Level-Exciton Decay in Magnesium Oxide
, Phys. Rev. Lett.
124
, (20), 207401: 1-6 (2020)
S.D.C. Roscam Abbing, F. Campi, F.S. Sajjadian, N. Lin, P. Smorenburg and P.M. Kraus,
Divergence Control of High-Harmonic Generation
, Phys. Rev. Appl.
13
, (5), 054029: 1-9 (2020)
L. Barreau, A.D. Ross, S. Garg, P.M. Kraus, D.M. Neumark and S.R. Leone,
Efficient table-top dual-wavelength beamline for ultrafast transient absorption spectroscopy in the soft X-ray region
, Sci. Rep
10
, (1), 5733: 1-9 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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ARCNL Newsletter