May 11, 2020
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan, Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography, Nature Commun. 11, (1), 2334: 1-8 (2020)