May 10, 2018
R. Fallica, J. Haitjema, L. Wu, S. Castellanos Ortega, A.M. Brouwer and Y. Ekinci, Absorption coefficient of metal-containing photoresists in the extreme ultraviolet, J. of Micro/Nanolithography. MEMS and MOEMS 17, (2), 023505: 1-7 (2018)