February 4, 2020
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos Ortega, The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography, ACS Appl. Mater. Interfaces 12, (8), 9881-0889 (2020)