News

Successful PhD defenses: three Researchers earn their doctorate

Published on March 20, 2025
Categories Contact Dynamics, EUV Plasma Processes, Nanoscale Imaging and Metrology

Zhouping Lyu, ‘High-resolution Imaging Through a Multimode Fiber: From Raster-scanning to Compressive Sensing’

On December 11th, Zhouping defended her thesis at Vrije Universiteit Amsterdam. Zhouping did her doctoral research in the group of Lyuba Amitonova. She explored how optical multimode fibers (MMFs) – renowned for their compactness, flexibility, and high mode density – can be harnessed for imaging across fields, such as neuroscience and semiconductor metrology. Zhouping developed an innovative compressive imaging technique that enables high-speed, super-resolution 3D imaging through a hair-thin, flexible probe. This approach not only enhances resolution but also delivers greater speed and flexibility, showcasing the potential of MMFs for advanced imaging applications.

 

Zhouping will start the next chapter in her career at Johnson & Johnson, focusing on intraocular lens design.

Yahia Mostafa, ‘Mass & Energy Efficient Tin Laser Produced Plasma Light Sources’

On January 10th, Yahia defended his thesis at Vrije Universiteit Amsterdam. At ARCNL, Yahia set out to explore and characterize tin plasma extreme ultraviolet light sources alternative to the current industry standard.

Yahia’s work has attracted attention from both science and industry. As his promotor, Oscar Versolato, noted: “There is clearly interest in Yahia’s research from science and industry related to lithography and EUV sources. We saw this, for example, at the EUV Source Workshop 2024 in Amsterdam.”

As a next step in his career, Yahia will explore opportunities in data science, where he aims to analyze large-scale data and uncover meaningful stories.

Cyrian Leriche, ‘Visualizing, quantifying, and understanding nanowear of hard multi-asperity contacts’

On February 25th Cyrian defended his thesis at the University of Amsterdam. As PhD student in the Contact Dynamics group of Bart Weber, Cyrian worked on the complexities of wear mechanisms across different scales. His research bridges the understanding from single asperity contacts to large multi-asperity contacts, providing valuable insights into tribochemical wear and its manipulation through environmental conditions.

In ASML lithography machines, silicon wafers are loaded onto the wafer stage and subsequently moved in horizontal direction with extremely high precision and acceleration. Tribological findings contribute to making this process as efficient as possible.

Currently, Cyrian is continuing his research as a Postdoc at the University of Pennsylvania, where he is exploring new physical systems and applications.