Four PhD defenses in one week

Published on October 2, 2023
Category EUV Plasma Processes

ARCNL is proud to announce that the week of October 2, 2023 is a special one with four PhD defenses in total.

Lars Behnke starts on Monday defending his thesis entitled “Efficient EUV Light Plasma Sources Driven by a 2-μm-Wavelength Laser” at the VU.

On Friday, Zoi Bouza, starts at 11: 45 at the VU with her thesis entitled “Developments for Broadband Spectral and Spatial Characterization of Tin Plasma Light Sources for EUV Lithography”.

At he University of Amsterdam, Feng-Chun Hsia continuous at 13:00 on “Nanoscale Topography and Wear of Ceramic Interfaces and their effect on Macroscale Friction”. Overlapping at the VU starting at 13:45 starts Lucas Poirier on “Ion Diagnostics for Extreme Ultraviolet Nanolithography”.

ARCNL congratulates all four researchers and wishes them a good future in their next positions at ASML (Feng-Chun Hsia, and Lars Behnke), and TNO (Lucas Poirier).