Beyond extreme ultraviolet light source plasmas: Theory and experiment
Work Activities
This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography.
In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)].
Background
The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about light sources that radiate at even shorter wavelengths below 13.5 nm, which could open up a host of applications in future nanolithography, metrology, as well as biological imaging. There are many open questions: what elements should be used to generate the required radiation? how do we generate as many ‘usable’ photons from the plasma as possible? What are the optimal laser and target properties?
Project goal
The goal of this joint experiment-theory project is to elucidate the properties of beyond-EUV radiating plasmas. The work will entail performing experiments and numerical modeling of plasmas to quantify, for instance, the radiative properties of the plasma, how many fast-moving ions are produced, as well as the efficiency of converting input laser light into the desired photons. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, to work with advanced laser technologies, and to understand the emission of light and ions from plasma that you generate.
Qualifications
- You have (or will soon obtain) an MSc degree in (Applied) Physics
- Knowledge of experimental atomic, plasma and/or laser physics is an asset, especially if combined with strong hands-on laboratory skills
- Programming experience, particularly in Python, is welcomed
- Strong verbal and written communication skills in English are required
Work environment
ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe. www.arcnl.nl
Working conditions
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 3.115 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.
More information?
For further information about the position, please contact John Sheil: j.sheil@arcnl.nl.
Application
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Online screening may be part of the selection.
Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.
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