Workshop on Low-energy electrons: Lithography, Imaging, and Soft Matter (LEELIS-III)
We are pleased to announce LEELIS-III, a unique platform to focus on the role of low-energy electrons in imaging and nanolithography. While low-energy electrons play a key role in very diverse processes, ranging from radiology to astrochemistry, they are of particular importance for industrial extreme ultraviolet lithography (EUVL) and low-energy electron microscopy (LEEM). In both these examples, sensitive material (photoresists, soft matter) is exposed to ionizing radiation and low-energy electrons. However, we know little of how low-energy electrons propagate in different materials, or how they induce chemical reactions. Filling this knowledge gap is essential for moving EUVL and LEEM forward, and particularly for pushing lithography to its physical limits.
Location: Science Park Amsterdam, WCW conference rooms, Science Park 123, 1098 XG Amsterdam, the Netherlands.