Low-energy electrons: Lithography, Imaging, and Soft Matter
12 & 13 November 2018, Amsterdam

We are pleased to announce LEELIS-III, a unique platform to focus on the role of low-energy electrons in imaging and nanolithography. While low-energy electrons play a key role in very diverse processes, ranging from radiology to astrochemistry, they are of particular importance for industrial extreme ultraviolet lithography (EUVL) and low-energy electron microscopy (LEEM). In both these examples, sensitive material (photoresists, soft matter) is exposed to ionizing radiation and low-energy electrons. However, we know little of how low-energy electrons propagate in different materials, or how they induce chemical reactions. Filling this knowledge gap is essential for moving EUVL and LEEM forward, and particularly for pushing lithography to its physical limits.

Following the success of the first and second LEELIS workshops, we address the interactions between low-energy electrons and soft matter from different perspectives. We will bring together experts from complementary fields such as condensed matter physics, EUVL, low-energy electron microscopy and engineering to come to novel insights on the physics of low-energy electrons, and the chemistry they induce.

The program of the workshop is built around invited lectures, student lectures (selected from the submitted abstracts) and poster presentations, and will allow ample time for discussions.


  • Sonia Castellanos Ortega (Advanced Research Center for Nanolithography, NL)
  • Sense-Jan van der Molen (Leiden University, NL)
  • Mark Golden (University of Amsterdam, NL)

Science Park Amsterdam, WCW conference rooms, Science Park 123, 1098 XG Amsterdam, the Netherlands.

Mondag, November 12, 2018

  • 08.30h: Start of registration
  • 09.30h: Start of program
  • 18.30h: Workshop dinner

Tuesday, November 13, 2018

  • 09.30h: Start of program
  • 15.40h: End of program
  • 15.40-17.00h: Optional visit to ARCNL laboratories

Workshop dinner
The dinner on Monday, November 12 will be held in the restaurant “In de Waag”, Nieuwmarkt 4, Amsterdam.
All metro lines stop at the Nieuwmarkt, except line 50. For more information, see www.indewaag.nl

ARCNL lab tour (optional)
At the end of the workshop program there is an optional visit to ARCNL’s laboratories
Please register (see registration submission) for this visit if you would like to join

Registration & submission
The registration & abstract submission starts on June 2, 2018.
Registration fee is 125 Euro for early birds* (May 31 until October 8)
and 175 Euro for regular registration (October 8 until November 9)
*Payments must be made within the period of May 31 until October 8 to qualify for the early bird rate!

Important dates

  • June 2, 2018
    Start of Early Bird Registration
    Start of Abstract Submission
  • October 8, 2018
    Start of Regular Registration
    Closure of registration for abstract
    Registration is open until the start of the workshop
  • November 12-13, 2018
    LEELIS-III Workshop