Low-energy electrons: Lithography, Imaging, and Soft Matter
12 & 13 November 2018, Amsterdam

Program & Invited speakers

Program Monday, November 12, 2018
Registration starts 8:30
Program starts 9:30
Conference Dinner starts 19:00 – 22:00

Program Tuesday, November 13, 2018
Program starts 9:30
End of workshop: around 15:30
Optional tour 15:40 – 17:00

List of invited speakers

  • Petra Swiderek (Uni Bremen, Germany ) – Electron-induced Chemistry: Fundamentals and Applications in Nanofabrication
  • Armin Kleibert (PSI, Switzerland) – X-ray photo-emission microscopy as a versatile tool for surface and interface investigations at the nanoscale
  • Wolfgang Werner (TU Wien, Austria) – Investigation of low energy electrons interacting with PMMA using one- and two-electron spectroscopies
  • Ivan Pollentier (IMEC, Belgium) – Unraveling the chemical reactions of photoresists upon exposure with EUV
  • Greg Denbeaux (SUNY Polytechnic, VS) – Understanding secondary electrons interactions in chemically amplified EUV resists
  • Ruben Maas (ASML, The Netherlands) – Accurate CD-SEM metrology for lithography
  • Alex Guiliani (SOLEIL, France) – Electron impact activation of isolated ions in a linear ion trap
  • Alex Vaglio Pret (KLA-Tencor, VS) – Modeling and simulation of electron scattering in organic and inorganic EUV lithography
  • Rudolf Tromp (IBM, The Netherlands) – Low energy electron interactions with thin resist films – a new perspective
  • Ivan Bespalov (ARCNL, The Netherlands) – Investigations of EUV resists with Low Energy Electrons Microscopy
  • Petra Rudolf (Uni Groningen, The Netherlands) – Electron-induced reactions for growth of novel materials

Click here for the program: