Highlighted ARCNL papers

Published on August 23, 2023
Category EUV Plasma Processes

Two recent papers of the EUV Plasma Processes group of Oscar Versolato were selected as an Editor’s pick. Alumnus Bo Liu is the first author of the Physical Review Applied publication: Mass partitioning in fragmenting tin sheets, selected as Editor’s Suggestion.
Optics Letters highlighted the paper Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates, with PhD student Yahia Mostafa as first author.