This two-year postdoc project is at the interface between science and applications. Accelerated technological change in the semiconductor industry is driven by the continuous reduction of feature size. Printing the …
This project is devoted to developing and employing numerical modelling of hot and dense plasma under conditions relevant for state-of-the-art extreme-ultraviolet (EUV) nanolithography, where laser-driven plasma sources are used to …
This two-year postdoc project is at the interface between science and applications and is part of a larger European effort, joined in the ECSEL JU IT2 consortium, which aims to …
