Event
Towards molecular-scale kinetic Monte Carlo simulation of pattern formation in photoresist materials for EUV nanolithography
A closed session
Date | 19 October 2022 | Time | 11:00 - 12:00 |
---|---|---|---|
Location | ARCNL Canteen and Virtual | ||
Speaker | Reinder Coehoorn (Eindhoven University of Technology) | ||
Category | Colloquium |
A closed session
© ARCNL 2024