Publications - ARCNL

L. Wu, Metal oxo clusters: molecular design for extreme ultraviolet lithography, University of Amsterdam, 2020-11-18
L. Wu, I. Bespalov, K. Witte, O. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos, Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy, J.Mater.Chem.C 8, 42: 14757-14765 (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos, Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography, J.Mater.Chem.C 8, 41: 14499-14506 (2020)
N. Thakur, A. Giuliani, L. Nahon and S. Castellanos, Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications, J. Photopolym. Sci. Tec. 33, 2: 153-158 (2020)
N. Sadegh, M. van der Geest, J. Haitjema, F. Campi, S. Castellanos, P.M. Kraus and A.M. Brouwer, XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy, J. Photopolymer. Sci.Tec. 33, 2: 145-151 (2020)
O. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Tec. 33, 2: 229-234 (2020)
F. Holtrop, A.R. Jupp, N.P. Leest, M. Paradiz Dominguez, R.M. Williams, A.M. Brouwer, B. Bruin, A.W. Ehlers and J.C. Slootweg, Photoinduced and Thermal Single‐Electron Transfer to Generate Radicals from Frustrated Lewis Pairs, Chem. Eur. J. 26, 41: 9005-9011 (2020)
O. Lugier, U. Pokharel and S. Castellanos, Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films., Cryst. Growth Des. 20, 8: 5302-5309 (2020)
J. Haitjema, Exciting tin-oxo cages: light-induced chemistry for nanopatterning, University of Amsterdam, 2020-06-03
C. Dieleman, Weiyi Ding, L. Wu, N. Thakur, I. Bespalov, B. Daiber, Y. Ekinci, S. Castellanos and B. Ehrler, Universal Direct Pattering of Colloidal Quantum Dots by (Extreme) Ultraviolet and Electron Beam Lithography, Nanoscale 12, 20: 11306-11316 (2020)

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