Publications - ARCNL

L. Wu, I. Bespalov, K. Witte, O. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos, Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy, J.Mater.Chem.C, (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos, Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography, J.Mater.Chem.C, (2020)
N. Thakur, A. Giuliani, L. Nahon and S. Castellanos, Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications, J. Photopolym. Sci. Tec. 33, 2: 153-158 (2020)
N. Sadegh, M. Geest, J. Haitjema, F. Campi, S. Castellanos, P.M. Kraus and A.M. Brouwer, XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy, J. Photopolymer. Sci.Tec. 33, 2: 145-151 (2020)
O. Lugier, A. Troglia, N. Sadegh, L. Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Tec. 33, 2: 229-234 (2020)
O. Lugier, U. Pokharel and S. Castellanos, Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films., Cryst. Growth Des. 20, 8: 5302-5309 (2020)
J. Haitjema, Exciting tin-oxo cages: light-induced chemistry for nanopatterning, University of Amsterdam, 2020-06-03
C. Dieleman, Weiyi Ding, L. Wu, N. Thakur, I. Bespalov, B. Daiber, Y. Ekinci, S. Castellanos and B. Ehrler, Universal Direct Pattering of Colloidal Quantum Dots by (Extreme) Ultraviolet and Electron Beam Lithography, Nanoscale 12, 20: 11306-11316 (2020)
D. Petrova, D.K. Sharma, M. Vacha, D. Bonn, A.M. Brouwer and B. Weber, Ageing of Polymer Frictional Interfaces: The Role of Quantity and Quality of Contact, ACS Appl. Mater. Interfaces 12, 8: 9890-9895 (2020)
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos, The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography, ACS Appl. Mater. Interfaces 12, 8: 9881-0889 (2020)

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

© ARCNL 2020