Which processes take place within an EUV emitting plasma? And how do they influence the amount of EUV light and debris the plasma emits? To answer these questions, this group will model the plasma dynamics on different timescales.
Modelling of EUV Plasma Dynamics
The plasma that arises when a tin droplet is hit by a laser is initially close to local thermal equilibrium. Under such circumstances the system is characterized by merely two parameters: the pressure and temperature distributions. This complicates an investigation of the plasma properties, since the more a system is in equilibrium, the fewer material-specific observables remain.
The plasma will expand though, and by doing so will transform in a severe out of equilibrium state. This so-called afterglow is a source of information for the modelling group. By observing, modelling and simulating the temperatures, particle densities and pressures after the early phase, the group aims to deduct what happened inside the ‘black box’ right after the laser hit the tin droplet.
The overall aim is to gain a theoretical and numerical understanding of these types of ultra-dense, high energy plasma’s, and by doing so contribute to a more efficient EUV production process with less collateral damage. The ARCNL group will act as a worldwide hub for different experts in this field, where a dialogue is established to advance the knowledge about these types of plasmas.
To be able to both validate the model with experimental data, and use the model to help interpret the outcome of experiments, this group will act in close collaboration with ARCNL’s EUV Plasma Processes group.