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Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
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EUV Photoresists
Group leader:
Prof. dr. Fred Brouwer (a.i.)
EUV Photoresists
Research activities
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Latest Publications
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L. Wu,
Metal oxo clusters: molecular design for extreme ultraviolet lithography
, University of Amsterdam, 2020-11-18
L. Wu, I. Bespalov, K. Witte, O. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos,
Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy
, J.Mater.Chem.C
8
, 42: 14757-14765 (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos,
Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
, J.Mater.Chem.C
8
, 41: 14499-14506 (2020)
N. Thakur, A. Giuliani, L. Nahon and S. Castellanos,
Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications
, J. Photopolym. Sci. Tec.
33
, 2: 153-158 (2020)
N. Sadegh, M. van der Geest, J. Haitjema, F. Campi, S. Castellanos, P.M. Kraus and A.M. Brouwer,
XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy
, J. Photopolymer. Sci.Tec.
33
, 2: 145-151 (2020)
O. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos,
Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers
, J. Photopolym. Sci. Tec.
33
, 2: 229-234 (2020)
O. Lugier, U. Pokharel and S. Castellanos,
Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films.
, Cryst. Growth Des.
20
, 8: 5302-5309 (2020)
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos,
The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography
, ACS Appl. Mater. Interfaces
12
, 8: 9881-0889 (2020)
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos,
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
, J. of Micro/Nanolithography. MEMS and MOEMS
18
, 4: 043504: 1-11 (2019)
L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos,
Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method
, Eur. J. Inorg. Chem.
2019
, 38: 4136-4141 (2019)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
News
Events
Repository
Contact & Directions
Newsletter