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EUV Photoresists
Group leader:
Prof. dr. Fred Brouwer (a.i.)
EUV Photoresists
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Latest Publications
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I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos,
The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography
, ACS Appl. Mater. Interfaces
12
, 8: 9881-0889 (2020)
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos,
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
, J. of Micro/Nanolithography. MEMS and MOEMS
18
, 4: 043504: 1-11 (2019)
L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos,
Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method
, Eur. J. Inorg. Chem.
2019
, 38: 4136-4141 (2019)
Y. Zhang,
Organotin Photoresists for extreme ultraviolet lithography
, University of Amsterdam, 2019-04-11
N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos:
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, , 2019.
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos:
The role of the organic shell in hybrid molecular materials for EUV lithography
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, , 2019.
L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos,
Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists
, J. of Micro/Nanolithography. MEMS and MOEMS
18
, 1 (2019)
L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos,
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
, J.Mater.Chem.C
7
, 1: 33-37 (2019)
R. Fallica, J. Haitjema, L. Wu, S. Castellanos, A.M. Brouwer and Y. Ekinci,
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
, J. of Micro/Nanolithography. MEMS and MOEMS
17
, 2: 023505: 1-7 (2018)
S. Castellanos, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung:
Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
In:
Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography held 25 February - 1 March 2018 San Jose, California, United States, SPIE., 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)
