Publications - ARCNL

M.L.S. van der Geest, N. Sadegh, T.M. Meerwijk, E.I. Wooning, L. Wu, R. Bloem, S. Castellanos Ortega, A.M. Brouwer and P.M. Kraus, Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source, Rev. Sci. Instrum. 92, (11), 113004: 1-9 (2021)
L. Wu, M.F. Hilbers, O. Lugier, N. Thakur, M. Vockenhuber, Y. Ekinci, A.M. Brouwer and S. Castellanos Ortega, Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography, ACS Appl. Mater. Interfaces 13, (43), 51790-51798 (2021)
J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, UV and VUV-induced fragmentation of tin-oxo cage ions, Phys. Chem. Chem. Phys. 23, (37), 20909-20918 (2021)
O. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers, ACS Appl. Mater. Interfaces 13, (36), 43777-43786 (2021)
M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek, Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography, Phys. Chem. Chem. Phys. 23, (31), 16646-16657 (2021)
C.D. Dieleman, Patterning Colloidal Nanocrystals with Light and Electrons, University of Amsterdam, 2021-06-30
O. Lugier, Surface-Mounted Metal-Organic Frameworks for Extreme Ultraviolet Lithography, University of Amsterdam, 2021-06-03
Y. Zhang, J. Haitjema, S. Castellanos Ortega, O. Lugier, N. Sadegh, R. Ovsyannikov, E. Giangrisostomi, F.O.L. Johansson, E. Berggren, A. Lindblad and A.M. Brouwer, Extreme ultraviolet photoemission of a tin-based photoresist, Appl.Phys.Lett. 118, (17), 171903: 1-6 (2021)
L. Wu, Metal oxo clusters: molecular design for extreme ultraviolet lithography, University of Amsterdam, 2020-11-18
L. Wu, I. Bespalov, K. Witte, O. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos Ortega, Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy, J.Mater.Chem.C 8, (42), 14757-14765 (2020)

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