Publications - ARCNL

L. Wu, Metal oxo clusters: molecular design for extreme ultraviolet lithography, University of Amsterdam, 2020-11-18
L. Wu, I. Bespalov, K. Witte, O. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos, Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy, J.Mater.Chem.C 8, 42: 14757-14765 (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos, Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography, J.Mater.Chem.C 8, 41: 14499-14506 (2020)
N. Thakur, A. Giuliani, L. Nahon and S. Castellanos, Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications, J. Photopolym. Sci. Tec. 33, 2: 153-158 (2020)
N. Sadegh, M. van der Geest, J. Haitjema, F. Campi, S. Castellanos, P.M. Kraus and A.M. Brouwer, XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy, J. Photopolymer. Sci.Tec. 33, 2: 145-151 (2020)
O. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Tec. 33, 2: 229-234 (2020)
O. Lugier, U. Pokharel and S. Castellanos, Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films., Cryst. Growth Des. 20, 8: 5302-5309 (2020)
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos, The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography, ACS Appl. Mater. Interfaces 12, 8: 9881-0889 (2020)
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos, Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters, J. of Micro/Nanolithography. MEMS and MOEMS 18, 4: 043504: 1-11 (2019)
L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos, Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method, Eur. J. Inorg. Chem. 2019, 38: 4136-4141 (2019)

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

T. +31 20 8517100
E-mail: arcnlsecretariaat@arcnl.nl

© ARCNL 2021