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EUV Photoresists
Group leader:
Dr. Sonia Castellanos Ortega
EUV Photoresists
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Latest Publications
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N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos:
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, , 2019.
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos:
The role of the organic shell in hybrid molecular materials for EUV lithography
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, , 2019.
L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos,
Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists
, J. Micro/Nanolith. MEMS and MOEMS
18
, 1 (2019)
L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos,
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
, J.Mater.Chem.C
7
, 1: 33-37 (2019)
R. Fallica, J. Haitjema, L. Wu, S. Castellanos, A.M. Brouwer and Y. Ekinci,
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
, J. Micro/Nanolith. MEMS and MOEMS
17
, 2: 023505: 1-7 (2018)
S. Castellanos, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung:
Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
In:
Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography held 25 February - 1 March 2018 San Jose, California, United States, SPIE., 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)
Y. Zhang, J. Haitjema, X. Liu, F. Johansson, A. Lindblad, S. Castellanos, N. Ottosson and A.M. Brouwer,
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
, J. Micro/Nanolith. MEMS and MOEMS
16
, 2: 123510: 1-7 (2017)
Y. Zhang, J. Haitjema, X. Liu, F. Johansson, A. Lindblad, S. Castellanos, N. Ottosson and A.M. Brouwer:
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
In:
Advances in Patterning Materials and Processes XXXIV : conference held in San Jose, California, February 26, 2017 /ed. C.K. Hohle and R. Gronheid, SPIE., 2017. - pp. 1014606: 1-10 (Proceedings SPIE; 10146)
R. Fallica, J. Haitjema, L. Wu, S. Castellanos, A.M. Brouwer and Y. Ekinci:
Absorption and exposure kinetics of photoresists at EUV
In:
Extreme Ultraviolet (EUV) Lithography VIII : conference held in San Jose, California, February 26, 2017 /ed. E.M. Panning and K.A. Goldberg, SPIE., 2017. - pp. 101430A: 1-11 (Proceedings SPIE; 10143)
