Extreme ultraviolet light from a tin plasmadriven by a 2-μm-wavelength laser

Publication date
DOI http://dx.doi.org/10.1364/oe.411539
Reference O.O. Versolato, L. Behnke, R. Schupp, Z. Bouza, M. Bayraktar, Z. Mazzotta, R.A. Meijer, J. Sheil, S. Witte, W.M.G. Ubachs and R. Hoekstra, Extreme ultraviolet light from a tin plasmadriven by a 2-μm-wavelength laser, Opt. Express 29, 3: 4475-4487 (2021)
Groups EUV Generation & Imaging, EUV Plasma Processes

An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by laser pulses, of 4.8 ns duration, produced from a KTP-based 2-µm-wavelength master oscillator power amplifier. Comparative spectroscopic investigations are performed for plasmas driven by 1-µm- and 2-µm-wavelength pulsed lasers, over a wide range of laser intensities spanning 0.5 − 5 × 1011 W/cm 2. Similar extreme ultraviolet (EUV) spectra in the 5.5–25.5 nm wavelength range and underlying plasma ionicities are obtained when the intensity ratio is kept fixed at I1µm/I2µm = 2.4(7). Crucially, the conversion efficiency (CE) of 2-µm-laser energy into radiation within a 2% bandwidth centered at 13.5 nm relevant for industrial applications is found to be a factor of two larger, at a 60 degree observation angle, than in the case of the denser 1-µm-laser-driven plasma. Our findings regarding the scaling of the optimum laser intensity for efficient EUV generation and CE with drive laser wavelength are extended to other laser wavelengths using available literature data.