NEVAC SYMPOSIUM 2020


Friday, 15 May 2020 | Amsterdam Science Park

WELCOME

The NEVAC Symposium 2020 is organized by the Advanced Research Center for Nanolithography (ARCNL). We offer an attractive program of lectures, posters, exhibition, the NEVAC Annual Meeting and lab tour of ARCNL. As usual the symposium is free of charge for members of the NEVAC.

Organizers

  • Prof. Joost Frenken
  • Dr. Jan Verhoeven
  • Dr. Roland Bliem

Location

  • Amsterdam Science Park Congress Center (lectures, posters, exhibition, lunch)
    Science Park 125, 1098 XG Amsterdam
  • ARCNL, Advanced Research Center for Nanolithography (lab tour, drinks)
    Science Park 106, 1098 XG Amsterdam

Program Friday, 15 May 2020

09.30 Arrival + Coffee (Amsterdam Science Park Congress Center)

10.00 PLENARY SESSION

  • Ron Heeren (Maastricht University)
    Ions, Images and Innovation: How molecular microscopes make medicine more precise
  • Rutger Schlatmann (Helmholtz Zentrum, Berlin)
    Pushing solar energy conversion beyond today´s efficiency and cost limits
  • NEVAC-Prize, including lecture

11.45 NEVAC Annual Meeting + Lunch
11.45 Lunch + Poster Session

13.30 PARALLEL SESSION A

  • Eric Louis (University of Twente)
    Recent developments in optics for EUV-lithography
  • Gosse de Vries (ASML, Veldhoven)
    EUV lithography and its vacuum of a kind
  • Bart Weber (ARCNL, Amsterdam)
    Why does friction limit our ability to make smart phones smarter?

13.30 PARALLEL SESSION B

  • Diederik Depla (Ghent University)
    Impurity dominated film growth
  • Thomas Lucas (Eindhoven University of Technology & ARCNL)
    Smart*Light: A Compact Inverse Compton X-ray Source
  • Mehdi Saedi (Leiden University)
    Formation of two-dimensional materials on liquid metal catalysts: An in situ investigation

15.00 Tea break

15.30 PLENARY SESSION

  • Ulrike Diebold (Vienna University of Technology)
    Oxide Surfaces at the Atomic Scale

16.15  Transfer to ARCNL (5 minutes walking to MATRIX-VII Building)
Lab tour ARCNL
Drinks
18.00 END

Registration

Registration is required to participate in the NEVAC Symposium 2020. Registration is free of charge for NEVAC members.
For non NEVAC members, a modest fee of € 50 is requested.
Deadline for registration is Thursday, April 30, 2020.
Please go to registration page