Scientific Internship: Influencing the surface topography of very hard carbon-based films

Date posted July 8, 2020
Type Scientific internships

In this project, you will set-up a laboratory method for the polishing of very hard carbon-based films, use advanced and novel experimental techniques to unravel the effects of different polishing parameters on the surface topography of these films, and contribute to research into their tribological behaviour.

Are you interested in unraveling how to control the surface topography of hard carbon-based films and at the same time contributing to the solving of friction-related challenges in computer chip production?

The research field of tribology, devoted to contact formation, friction and wear phenomena down to the atomic scale, is of direct and pressing relevance to the manufacture of semiconductor devices. Friction-induced stresses and deformations on the scale of only a few atomic spacings are starting to challenge the future of nanolithography technology, limiting the achievable feature size in semiconductor chips. Surface topography, and the physics and chemistry of the materials involved, play essential roles.

In this project, you will set-up a practical method that can be used in the ARCNL Contact Dynamics laboratory for the polishing of very hard carbon-based films deposited on test samples. Following this you will use a combination of advanced and novel experimental techniques to unravel the effects of different parameters on the surface topography of these films. You will also assist in research into the effect of the film characteristics on the tribological behaviour when rubbing against silicon wafers under different conditions.

You will be embedded in the Contact Dynamics team at ARCNL but will also be closely associated with the University of Amsterdam and ASML, the world leading manufacturer of high-tech lithography machines for chip making.

About the group

At the Advanced Research Center for Nanolithography (ARCNL) we carry out exciting fundamental physics at the highest possible level with relevance to key technologies in nanolithography. We contribute to the production of ever smarter and smaller electronics, while at the same time pushing the boundaries of our fundamental insight into the workings of nature.

The research activities of the Contact Dynamics group aim at investigating and providing fundamental understanding of the mechanisms underpinning friction, friction changes over time and friction variability, as affected by wear phenomena, at forces, scales and other preconditions relevant to present and future nanolithography technology. This includes the generation and dynamic behaviour of wear particles and their influence on the subsequent wear and friction, and the study of the mechanics of contacts at multi-asperity level.

Qualifications

You have or will soon have a Bachelors degree in physics, materials science & engineering, or a related field and (will) participate in a Master study. The internship must be a mandatory part of your curriculum. You have a nationality of an EU-member state and/or you are a student at a Netherlands University. You must be available for at least 5 months.

Terms of employment

At the start of the traineeship your trainee plan will be set out, in consultation with your ARCNL supervisor, including a small allowance.

Contact info

Prof. Steve Franklin
Co-Group leader Contact Dynamics
E-mail: s.franklin@arcnl.nl
Phone: +31 (0)6 374 60065

Or:

Dr. Bart Weber
Co-Group leader Contact Dynamics
E-mail: b.weber@arcnl.nl
Phone: +31 20 8517100

You can respond to this vacancy online via the button below.

Please annex your:
–  Resume;
–  List of followed courses plus grades.

Online screening may be part of the selection.

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