Postdoctoral Research Associate in Laser-Plasma Physics
This project is devoted to developing and employing numerical modelling of hot and dense plasma under conditions relevant for state-of-the-art extreme-ultraviolet (EUV) nanolithography, where laser-driven plasma sources are used to provide the required EUV light. You will provide important insights accompanying the experimental efforts of ARCNL’s Source Department and moreover will directly and independently answer some of the key open questions in the field – using e.g. the simulation packages already available at ARCNL. Moreover, you will provide predictive modelling capabilities to guide the development of next-generation EUV light sources. You will be embedded in the EUV Plasma Processes team at ARCNL, where you will collaborate with a team of talented young researchers: theorists and experimentalists.
About the group
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is finalizing its buildup towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl
The research activities of the Plasma Theory and Modeling group at ARCNL are focused on the theoretical and numerical modelling of laser-driven plasma sources of EUV light for nanolithography. Research performed by the group covers topics in non-LTE atomic kinetics & spectral modelling, plasma expansion dynamics as well as tin droplet propulsion and deformation upon laser impact.
You need to meet the requirements for a doctors-degree and must have research experience in a non-Dutch academic environment. Knowledge and/or experience in the field of radiation-hydrodynamic simulations is advantageous. Good verbal and written communication skills (in English) are required.
Terms of employment
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Institutes Organisation of the Netherlands Organisation for Scientific Research (NWO-I) for a maximum duration of three years. ARCNL assists any new foreign postdocs with visa applications and compensates their transport costs and furnishing expenses.
Dr. John Sheil
Group leader Plasma Theory and Modeling
Phone: +31 (0)20-851 7100
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