Postdoc: Exploiting disorder for nanoscale imaging and metrology
As a postdoc, you will develop new concepts for non-invasive nanoscale imaging and metrology by integrating computational imaging, lensless microscopy and advanced light control in random media. The new approach will enable accurate characterization of nanostructures for the semiconductor industry.
While the semiconductor roadmap is approaching the single-digit nanometer era, the alignment and overlay control remain big challenges. Advances in alignment procedures as well as in overlay metrology can be a result of the improved design of the alignment marks and/or new metrology techniques.
Our aim is to develop a new metrology concepts that combines advanced phase control, computational image reconstruction and non-periodic alignment marks. New techniques will connect several modern and dynamic research areas that are still unconnected to date: computational imaging, complex wavefront shaping, compressive sensing and metrology. This will enable fast and accurate characterization of 3D multi-layer nanostructures and pave the way for better metrology tools for tomorrow’s nanolithography.
You will perform this project in the newly established research group ‘Nanoscale Imaging and Metrology’, and will collaborate with researchers from various other research groups at ARCNL and the VU University Amsterdam, as well as with researchers from semiconductor equipment manufacturer ASML. In addition to carrying out your own research program, you are also expected to coach a PhD candidate working on a related topic.
About the group
The Nanoscale Imaging and Metrology group is a new research group at ARCNL, headed by Dr. Lyuba Amitonova. Our ultimate goal is imaging beyond the limits. We are developing new label-free far-field imaging techniques with a spatial resolution beyond the Abbe (diffraction) limit and temporal resolution beyond the Nyquist limit. This will enable fast and accurate characterization of 3D multi-layer nanostructures and pave the way for better metrology tools for tomorrow’s nanolithography.
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl
You have a PhD in physics and a strong affinity for experiments combined with an interest in computational imaging algorithms with metrology applications. Knowledge of (computational) imaging technology, experimental optics, advanced programming methods and/or semiconductor metrology is considered an advantage. Good verbal and written communication skills in English are required.
Terms of employment
The position is intended as full-time (40 hours a week) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the a duration of two years, with the possibility of extension.
The salary, depending on relevant experience before the beginning of the employment contract, will be €3.432 to €4.339 (scale 10) gross per month, based on fulltime, exclusive 8 % holiday allowance and 8.33% end-of-year bonus, in accordance with NWO-I regulations for academic personnel. A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants. ARCNL assists any new foreign researchrs with housing and visa applications and compensates their transport costs and furnishing expenses.
Dr. Lyuba Amitonova
Group leader Nanoscale Imaging and Metrology
Phone: +31 (0)20-754 7100
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