PhD-student: Laser scattering and spectroscopy investigations of tin vapor targets for next-generation plasma sources of EUV light for nanolithography
This PhD project aims at understanding and controlling tin targets for laser-produced plasma, generating extreme ultraviolet (EUV) light for state-of-the-art nanolithography. In a team effort, in close collaboration with the ARCNL plasma theory & modelling group, we will answer the following question: What actually happens when an energetic laser pulse hits a microscopic tin droplet? What sort of particles (fragment droplets, atoms, or ions) are generated when violent phase explosions occur? How can we best prepare and visualize such tin targets to optimally interact with high-energy drive laser light? Answering these questions by focusing on experimental studies of the fundamental processes, using state-of-the-art wavelength tunable laser systems in the optical and ultraviolet to study (Mie) scattering and for performing active atomic spectroscopies, will enable the continuation of Moore’s law, producing ever more powerful computer chips. You will be embedded in the EUV Plasma Processes team at ARCNL, which frequently interacts with our industrial partner ASML.
About the group
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is finalizing its buildup towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl
The research activities of the EUV Plasma Processes group aim at the understanding of the fundamental dynamics at the atomic and molecular level in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.
You have an MSc in (applied) physics. Knowledge in the fields of experimental atomic, plasma, fluid physics, or laser physics is advantageous. Good verbal and written communication skills (in English) are required.
You will need to meet the requirements for an MSc-degree, to ensure eligibility for a Dutch PhD examination.
Terms of employment
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of one year, with the intention of an extension of three years. After successful completion of the PhD research a PhD degree will be granted by the Vrije Universiteit Amsterdam (VU). Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with visa applications and compensates their transport costs and furnishing expenses.
Prof.dr. Oscar Versolato and Wim Ubachs
Group leader EUV Plasma Processes
Phone: +31 (0)20-754 7100
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