Materials exposed to light inevitably suffer from optical damage when the light fluence keeps increasing. When using lasers as light sources, damage can take different forms, ranging from a reasonably …
Are you a Bachelor or Master student looking for an internship? The Nanoscale Imaging and Metrology group at ARCNL has multiple openings for students with the ambition to do cutting-edge …
As a PhD student you will develop a 3D lensless imaging system, using coherent extreme ultraviolet radiation as the light source. You will use this system to image complex lithographic …
In this project, you will use advanced and novel experimental techniques to unravel the effects of the surface topography of hard carbon-based films on their tribological behaviour under different conditions.
Het Linux team beheert de Linux server- en desktopomgeving van AMOLF en ARCNL. Het team is verantwoordelijk voor een deel van de netwerkinfrastructuur, zoals DNS en DHCP, en bestaat uit …
The Institute of Physics (IoP ) and the Advanced Research Center for Nanolithography (ARCNL) are expanding ARCNL’s Materials Theory and Modeling group and have an opening for a fully funded …
In our lab, we investigate the interaction of laser pulses with liquid tin microspheres to advance the knowledge of the physical processes that rule the extreme ultraviolet light (EUV) generation …
In our lab, we investigate the interaction of laser pulses with liquid tin microspheres to advance the knowledge of the physical processes that rule the extreme ultraviolet light (EUV) generation …
This project is devoted to developing and employing numerical modelling of hot and dense plasma under conditions relevant for state-of-the-art extreme-ultraviolet (EUV) nanolithography, where laser-driven plasma sources are used to …
Are you a Bachelor or Master student looking for an internship? The High-harmonic generation and EUV science group at ARCNL has multiple openings for students with the ambition to do cutting-edge scientific …
