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    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
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Jobs and internships

Category
  • PhD positions
  • Postdoc positions
  • Scientific internships
  • Support positions
  • PhD-student: Metasurface-based computational metrology

    April 16, 2021 · PhD positions

    PhD-student: In semiconductor manufacturing technology advanced metrology to inspect the quality of devices as they are manufactured is crucial. You will develop a new paradigm for metrology on the interface …

  • PhD-student: Nonlinear nanophotonic metasurfaces and materials for metrology

    April 15, 2021 · PhD positions

    As a PhD student, you will develop the optics of nonlinear metasurfaces for wafer metrology.  You will build an instrument to generate and measure nonlinear optical signals from nanostructured dielectric …

  • Onderzoekstechnicus / Research Technician

    April 7, 2021 · Support positions

    Het Advanced Research Center for Nanolithography (ARCNL) zoekt een technicus op HBO-niveau, ter ondersteuning van wetenschappelijk onderzoek op het gebied van laser- en optische fysica, fysica van gecondenseerde materie en …

  • PhD-student: Laser scattering and spectroscopy investigations of tin vapor targets for next-generation plasma sources of EUV light for nanolithography

    April 6, 2021 · PhD positions

    This PhD project aims at understanding and controlling tin targets for laser-produced plasma, generating extreme ultraviolet (EUV) light for state-of-the-art nanolithography. In a team effort, in close collaboration with the …

  • Scientific Internship: Unravelling the fundamental puzzle of friction with application to industrial nanolithography

    March 30, 2021 · Scientific internships

    In this project, you will use a combination of advanced and novel experimental techniques to unravel how contacts form between surfaces, how the contact conditions change over time, and how …

  • Scientific Internship: The origin of adhesive friction

    March 30, 2021 · Scientific internships

    In this project you will revisit lateral force microscopy experiments and systematically study the nature of the friction reductions.The research field of tribology, devoted to contact formation, friction and wear …

  • Postdoc: Femtosecond generation and detection of ultrahigh-frequency sound waves for the detection of buried nanostructures

    March 29, 2021 · Postdoc positions

    This two-year postdoc project is at the interface between science and applications and is part of a larger European effort, joined in the ECSEL JU IT2 consortium, which aims to …

  • PhD-student: Spatial coherence control for metrology applications

    March 29, 2021 · PhD positions

    As a PhD student, you will develop new methods for spatial coherence control. You will create a new type of bright laser sources with optimized coherence functions and wavefronts. Your …

  • PhD-student: Mechanical Metamaterials for Positioning

    March 29, 2021 · PhD positions

    Upon loading and unloading wafers in nanolithography machines, friction occurs between the wafer and its support. While some friction is required to fixate the wafer, inhomogeneous deformations and stresses that …

  • Two positions for PhD-students: Extreme ultraviolet lensless 3D imaging

    March 29, 2021 · PhD positions

    As a PhD student you will develop a 3D lensless imaging system, using coherent extreme ultraviolet radiation as the light source. You will use this system to image complex lithographic …

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter